Galvanic corrosion sensors commonly used for monitoring of atmospheric corrosion. Newly developed thin film sensor consists of two copper electrodes mounted on a polymeric or composite substrate. Two copper electrodes act as a cathode and anode. This sensor is a type of electrical circuits. One of the problems with these corrosion sensors is dendrite formation around cathode which creates a short circuit between the electrodes and the sensor is no longer usable. Dendrite formation is due to the moisture adsorption and anodic dissolution. Dendritic growth has been a known process in failure of microelectronic devices. In this research samples were prepared to evaluation of this phenomena corrosion sensors by using potentiodynamic polarization, potentiostatic and cyclic Voltammetry tests and scanning electron microscopy. Important parameters are the amount of potential difference applied, electric field between two electrodes, existence of sharp edges(surface roughness) and the rate of copper dissolution (affected by pH and contaminations). It is recognized that surface properties of substrate such as texture and morphology has an important role on the rate of nucleation in electrodeposition process. According to the similarity of dendritic growth to electrodeposition, the effect of electrodeposition of copper on cathode electrode from acidic sulfate bath investigated in this research. Direct current without additive and with KCl addition and also pulsed current were used for electrodeposition. In DC plating process with increasing current density deposits become coarser and evolution of (220) observed. By using 5×10 -4 mol/lit KCl additive intensity of (222) planes at current density of 5 mA/cm 2 and (111) planes at current density of 50 mA/cm 2 increased. In the higher amount of KCl (9×10 -4 mol/lit) preferential texture of deposits were (220). By using pulsed current, (5 mA/cm 2 ) deposit has a random orientation. In high pick current densities at pulsed electrodeposition, excessive growth of planes observed in SEM images that led to increase in surface roughness. KCl addition led to formation of smooth deposits that has a very low specific electrical resistance. Dendritic growth behavior of coated samples evaluated by using electrochemical techniques. In was observed that using KCl additive and pulsed electrodeposition at low current densities results in increase of short circuit time bye three to five times. Because of coarser morphology, samples coated at high current densities have not a higher short circuit time than uncoated sample. Morphology and texture of deposits have a main role in short circuit time. The effect of morphology is much higher than texture. These effects related to the decrease in surface energy. Evolutiom of random orientation has a positive effect on increasing the short circuit time, while increasing of (222) and