The goal of this research is to design, build and evaluate a mask projection micro stereolithography (MP?SL) system. MP?SL is an additive manufacturing process based on photopolymerization that uses digital light processing technology to selectively cure layers of photopolymer resin and fabricate a three dimensional part. In this research, the final performance of a MP?SL system is dependent on the sum of functional parts. These parts are as follows: Light source that produces the luminous energy and is projected onto the resin surface to selectively cure photopolymer. Conditioning optics that changes properties of the projected light for MP?SL applications. Dynamic mask that digitally patterns and projects incident light to selectively cure photopolymer. Projection orientation that is the position of the dynamic mask relative to the polymer container. Imaging optics that expand or reduce the projected image to achieve the desired image resolution. Recoat method that supplies liquid photopolymer over previous layers for the creation of new layers. Build platform that supports the object being made. Vertical actuator that repositions the build platform for creation of the new layers. Two different programs are needed for operating the manufacturing process. One program is controlled the stepper motor and one is used to display the sliced images. Photopolymer is the raw material used in MP?SL to fabricate three dimensional objects. In this process wavelengths of light between 380 to 420 nanometer are mostly used. Layer thickness and exposure time are important parameters in this system. Layer thickness and exposure time of resin are determined via working curve. A total of 90 disk with 14mm diameter are cured by the manufactured system. The exposure time was varied from 1 seconds to 8 seconds in incremental steps of 500ms. After solidification, the samples are cleaned with isopropyl alcohol and are dried by air. The thickness of the cured disks are then measured using a digital micrometer with an accuracy of ± 0.001mm and the corresponding working curve is plotted. Layer thickness must be equal to the cured depth. In this work, layer thickness is considered as 20 micron and exposure time as 0.66s. Performance of the photopolymer is determined via fabrication of a benchmark test part. Performance parameters consist of minimum feature size, xy plane accuracy, z-axis minimum feature size, and z-axis accuracy. These parameters should be determined via experiment for photopolymer resin. After determination of performance parameters, xy plane and z-axis dimensional error are specified. The minimum feature size is equal to 50 micron and the z-axis minimum feature size is equal to 20 micron. Furthermore xy plane dimensional error is equal to 0.707% and z-axis dimensional error is equal to 26.502%. Keywords: Mask projection micro stereolithography, Exposure time, Layer thickness, Benchmark test part, Performance parameters.